Components for electron beam technology

Home

Components for electron beam technology

We develop and manufacture components for Electron Beam Systems. Our customers are leading organizations like ETEC Corp., IBM, KLA-Tencor, Leica-Microsystems, Sematech International, and Carl Zeiss GmbH. Rapid prototyping, versatility and decades of experience in MEMS fabrication and electron optics are our key strength.

A typical component has chip size with a frame of wafer thickness and a smaller membrane area, containing the structures of interest. This can be one membrane area or in some cases several thin areas separated by strutwalls of full wafer thickness.

Our strength is plasma etching with:

well controlled profiles,
extremely small sidewall roughness
and very small corner radii.

We fabricate silicon membrane thickness typically ranging from 1 µm to 30 µm. The features can have a sidewall roughness less than 50 nm and an edge radius smaller than 300 nm.

Handling and shipping is possible without problems down to membrane thickness of only 30 nm.
Usual packaging is either a GelPack or a single wafer tray.

Typical examples

General Electron Optics

Courtesy of ETEC Corp.		Courtesy of IBM Corp.
Electron optical component	Silicon grating	Tungsten grating on Al/Si surface
Silicon thickness ~ 800 µm, vertical sidewalls	Parallel and crystal oriented vertical sidewalls Linewidth 100 nm, pitch 500 nm	Tungsten thickness 500 nm, with vertical sidewalls
Example shown: Part of miniaturized electron optical columns	Example shown: Calibration structure for SEMs and CD-SEMs	Example shown: Registation grid for electron beam lithography tools, exhibiting backscattered electron- and topography contrast.

Electron Projection Lithography

Courtesy of IBM Corp.
Stencil - Mask		Ultra Thin Membrane - Mask (UTM-Mask)
smallest features 200 nm for 2.5 µm membrane thickness		43% measured transmission measurement done by Sematech/Selete

Character Projection Lithography

Courtesy of Leica		Courtesy of Leica
Character projection mask		Beam shaping aperture

Transmission Electron Microscopy


Single slit aperture		Slit aperture array
membrane thickness up to 100 µm		membrane thickness up to 100 µm

Home